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52 Results
Name | Technology | Product Type | Description | |
|---|---|---|---|---|
| 9-AMM | Multi-layer photo-lithographic application | Monomers | Yellow powder m.p. 86–88°C | |
| DTBPIO-C1 | Deep UV | PAG | Strong acid(C1) generation m.p. 104–105°C | |
| DTBPIO-CS | Deep UV | PAG | Weak acid (camphorsulfonic acid) generation m.p. 215–217°C | |
| DTBPIO-Nf | Deep UV | PAG | Low diffusion strong acid(nonaflic acid) generation m.p. 175–177°C | |
| DTBPIO-TFMBS | Deep UV | PAG | Weak acid (o-trifluoromethylbenzenesulfonic acid) generation m.p. 162–164°C | |
| ECHA | Multi-layer photo-lithographic application | Monomers | Colourless liquid | |
| HAdMA | Multi-layer photo-lithographic application | Monomers | White powder m.p. 89–91°C | |
| HTPG-104S | i-line | PAG | White powder Strong acid (HCI) generation m.p. 143–145°C | |
| HTPI-405 | i-line | Photo-initiators | Weak acid generation m.p. 86-88°C | |
| HTPI-4057 | i-line | Photo-initiators | Weak acid generation m.p. 56-58°C | |
| HTPI-429 | i-line | Photo-initiators | Weak acid generation m.p. 71-74°C | |
| ILP-110 | i-line | PAG | Light-yellow powder Strong acid(triflic acid) generation m.p. 113–114°C | |
| ILP-110N | i-line | PAG | Low diffusion strong acid (nonaflic acid) generation m.p. 122–124°C | |
| ILP-113 | I, h-line broadband | PAG | Yellow powder Strong acid (triflic acid) generation m.p. 125–126°C | |
| ILP-118 | i-line | PAG | Light-yellow powder Strong acid(triflic acid) generation m.p. 66–68°C | |
| MAdMA | Multi-layer photo-lithographic application | Monomers | Colourless liquid | |
| MDT | Deep UV | PAG | White powder Strong acid (triflic acid) generation m.p. 88–89°C | |
| MNLMA | Multi-layer photo-lithographic application | Monomers | White powder m.p. 74~77°C | |
| NIN | i-line | PAG | White crystalline powder. Low diffusion Strong acid(nonaflic acid) generation m.p. 148.5–149.5°C | |
| NIT | i-line | PAG | White powder Strong acid(triflic acid) generation m.p. 210–214°C |