With thicker film resist demands, more and more formulations contain thermal acid generators to enable final curing during post-baking.
An IP-free set of products with different acid releasing temperatures is available from Heraeus. Semiconductor-grade purity and effective costs are mandatory in the final application.
3 Results
Name | Technology | Product Type | Description | |
|---|---|---|---|---|
| TA-101 | Multi-layer photo-lithographic application | Thermal Acid Generators | White powder 4.5% (w/w) in PGMEA m.p. 101–102°C | |
| TA-102 | Multi-layer photo-lithographic application | Thermal Acid Generators | White powder 2.5% (w/w) in PGMEA m.p. 126–127°C | |
| TA-103 | Multi-layer photo-lithographic application | Thermal Acid Generators | White powder 5% (w/w) in PGMEA m.p. 101–102°C |