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Photo Acid Generators (PAGs)

The computing power available to send the first man to the moon in 1969 was less than that available to each of us today on our smartphones. This incredible advance has been made possible by the miniaturization of microchips and the ever-evolving computing power of semiconductors.

The rise in wireless connectivity, sophisticated automotive features or the internet of things are reflected in the rise of demand for semiconductors capable of meeting the highest requirements. Ultra-pure specialty chemicals are the basic raw materials used in the photolithography process which forms the critical layer in the productions of memory and logic chips.

Heraeus Epurio, has been producing electronic grade photoactive materials for over 30 years. We have put together selected chromophores with vintage acids to create a unique product offering for critical layer resists in highest resolution.

Most of these products are available in UP quality boasting an above 99.5% purity and a metal content of all 26 metals below 10ppb each. This makes even conventional chemistry available for new frontiers in resist resolution.

Download our product catalog of Semiconductor Chemicals

35 Results

Product Type
DTBPIO-C1Deep UVPAGStrong acid(C1) generation m.p. 104–105°C
DTBPIO-CSDeep UVPAGWeak acid (camphorsulfonic acid) generation m.p. 215–217°C
DTBPIO-NfDeep UVPAGLow diffusion strong acid(nonaflic acid) generation m.p. 175–177°C
DTBPIO-TFMBSDeep UVPAGWeak acid (o-trifluoromethylbenzenesulfonic acid) generation m.p. 162–164°C
HTPG-104Si-linePAGWhite powder Strong acid (HCI) generation m.p. 143–145°C
ILP-110i-linePAGLight-yellow powder Strong acid(triflic acid) generation m.p. 113–114°C
ILP-110Ni-linePAGLow diffusion strong acid (nonaflic acid) generation m.p. 122–124°C
ILP-113I, h-line broadbandPAGYellow powder Strong acid (triflic acid) generation m.p. 125–126°C
ILP-118i-linePAGLight-yellow powder Strong acid(triflic acid) generation m.p. 66–68°C
MDTDeep UVPAGWhite powder Strong acid (triflic acid) generation m.p. 88–89°C
NINi-linePAGWhite crystalline powder. Low diffusion Strong acid(nonaflic acid) generation m.p. 148.5–149.5°C
NITi-linePAGWhite powder Strong acid(triflic acid) generation m.p. 210–214°C
PA-229Deep UVPAGWhite powder Low diffusion strong acid (nonaflic acid) generation m.p. 54–56°C
PA-253ArFPAGStrong acid generation m.p. 128–129°C
PA-255ArFPAGStrong acid generation m.p. 93-95°C
PA-279ArFPAGStrong acid generation m.p. 143-145°C
PA-296Deep UVPAGStrong acid(N3) generation m.p. 159-161°C
PA-298i-linePAGYellow powder Weak acid(tosylic acid) generation m.p. 130–131°C
PA-304Deep UVPAGStrong acid(C1) generation m.p. 130–131°C
PA-313ArFPAGStrong acid generation m.p. 129–130°C